Optical Patterned Wafer Inspection Equipment (OPWIE) Market Size 2023 to 2032

Optical Patterned Wafer Inspection Equipment (OPWIE) is a type of inspection equipment used in the semiconductor manufacturing process to detect defects in patterned wafers. Patterned wafers are wafers that have been processed to create the desired circuit pattern. Defects in patterned wafers can lead to malfunctioning semiconductors, so it is important to detect them early in the manufacturing process. OPWIE systems use optical techniques to image the patterned wafer and identify defects. The most common type of OPWIE system is the brightfield system, which uses a white light source to illuminate the wafer and a camera to capture the image. Other types of OPWIE systems include darkfield systems, which use a dark field illumination source to enhance the contrast of defects, and phase contrast systems, which use a phase contrast illumination source to improve the resolution of the image.

ID : IL_1167 | Språk: En/Jp/Fr/De | Utgivare: IL | Format: